Keyphrases
Anti-reflective
50%
Contact Layer
33%
Contamination-free
33%
Controlled Deposition
33%
Depositional System
50%
Dielectric Distributed Bragg Reflectors
16%
Dielectric Materials
16%
Electron Beam Deposition
33%
Film Uniformity
16%
Full Process
33%
High Reflective
16%
In Situ
16%
Metal Deposition
16%
Metal Layer
16%
Metal-dielectric Interface
16%
Microcavity Laser
33%
Multilayer Deposition
33%
Multilayer Stack
16%
Optical Quality
33%
Optoelectronic Applications
16%
Passivation Layer
16%
Photodiode
16%
Polariton Lasers
16%
Process Parameter Control
16%
Reflective Film
16%
Reflective Mirrors
100%
Semiconductors
16%
Sharp Interface
16%
Single Stack
33%
Specific Needs
16%
Sputter Deposition
16%
Structural Quality
16%
Sub-nanometer
33%
Surface Characterization
16%
Thickness Monitoring
33%
Ultralow Threshold
33%
US Military
16%
UV Wavelength
16%
Wavelength Range
16%
X-ray Photoelectron Spectroscopy
16%
Engineering
Bragg Cell
33%
Deposition System
100%
Dielectrics
100%
Film Uniformity
33%
Metal Layer
33%
Nanometre
33%
Optical Quality
33%
Optoelectronic Device
100%
Optoelectronics
33%
Passivation
33%
Photodiode
33%
Process Parameter
33%
Ray Photoelectron Spectroscopy
33%
Thin Films
33%
Material Science
Dielectric Material
100%
Film
66%
Sputter Deposition
33%
Surface Characterization
33%
Thin Films
33%
X-Ray Photoelectron Spectroscopy
33%